Products
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We offer high performance novolac resins for flat panel display and semiconductor photoresist applications with our unique technology. Plants
Laboratory
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Features
Advantages of our high performance polymers
- Stable performance with lower batch-to-batch variation by our advanced molecular weight control technology
- Excellent solubility control technology in alkali developer
- Excellent molecular weight distribution control technology with own unique synthesis technology
- Excellent molecular structure control technology with own unique synthesis technology
- Excellent formulation technology of various kinds of monomers to enhance its performance
Applications
Electrical and Electronic Equipment
Semiconductors
Photoresist for semiconductors, LCDs and other applications
Specifications
Photoresist pattern example
Lithograph pattern
Cross-section of pattern (SEM)
Topics More
- 2025/11/13 Products Launch of Mass Production of the Main Deck Cargo Liner for Airbus’ New A350F Freighter Aircraft
- 2025/10/23 Products Announcement of the Development of Wear-Resistant Phenolic Resin for Brake Friction Materials
- 2025/10/16 Products Announcement of the Brand Name and Logo for Ultra-Low Monomer Water-Soluble Phenolic Resin: AQNOA™
- 2025/09/10 Products Expansion of Product Lineup of Tribological (Low Friction and Low Wear) and High-Heat-Resistant Phenolic Resin Molding Compounds
- 2025/06/16 Products Commercialization of the World’s First Biomass-Derived Solid Novolac-Type Lignin-Modified Phenolic Resin
Phenolic Resins More
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