Sumitomo Bakelite Co., Ltd.
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April 10, 2001
SUMITOMO BAKELITE CO., LTD.

Development of a Positive Photosensitive Resin for Rerouting by relocation of wiring pads to array bumps

SUMITOMO BAKELITE CO., LTD. (Headquarters: at 2-5-8 Higashi Shinagawa, Shinagawa Ward, Tokyo; Tsuneo Moriya, President) has been marketing semiconductor coating resins "SUMIRESINEXCEL CRC SERIES" and recently developed a positive photosensitive resin CRC-8600 WLP/CSP for use in rerouting by relocation of wiring pads to an array of bumps, which has superior low-stress characteristics and solvent resistance.
The linear expansion coefficient is designed to be smaller than conventional rerouting resins for reduction of the stress of the package while the solvent resistance of the resin is also improved greatly, both of which advantages will contribute a lot to higher reliability of devices.

By utilizing the offered new product such a thick-film of 20um is available to facilitate the application in WLP/CSP using copper wiring.


Societal Background

Positive photosensitive resin for rerouting is used in the wafer-level and chip size packaging (WLP/CSP) fields.
It is a photosensitive resin used for insulating film for rerouting.
A film made of the resin can be developed in an alkaline aqueous solution and has such excellent characteristics as low-stress, low dielectric constant and low water absorption ratio.
In this field benzocyclobutene was used mainly as a prior, conventional material, which, however, had various problems and demerits such as consumption of too much solvents and fragility of the films formed therefrom.

Description of the Positive Photosensitive Resin for Rerouting.
The positive photosensitive resin for rerouting we have developed employs a rigid polybenzoxazole as its base resin by which higher solvent resistance than traditional films was obtained to enhance the chemical resistance against a variety of etching liquids used during rerouting process as well as the reflow durability under elevated temperature ranges.
The rigidity of the resin in its skeletal structure allowed to reduce the coefficient of linear thermal expansion thus to diminish the wafer warpage to a minimized level.
As for the patents the relevant basic patents were filed already by patent offices.
By using this technology thick-film multi-layered WLPs/CSPs with copper wiring became readily available.

Technological Features
1. Enhanced solvent resistance over conventional rerouting layers facilitating reflow process at an elevated temperature.
2. Minimized coefficient of linear thermal expansion allowing to lower the stress than 10MPa.
3. The development in aqueous solution is environment-friendly.
4. Polybenzoxelene used as the base resin allows to fit it for use in copper wiring because it is free from copper migration thereto, and thick films of 20ƒÊm approx. required for the applications are readily available.

Effects by adoption of the positive photosensitive resin for rerouting.
Improvements in reliability and yield of WLPs./CSPs. can be secured in accordance with the growth of smaller, higher speed devices.
We already shipped samples of this product to several clients, including overseas semiconductor manufacturers and we are going to commence full-scale mass-production from this year.

Thank you.